Electrodeposition of nanostructured cobalt films from a deep eutectic solvent: Influence of the substrate and deposition potential range

dc.contributor.authorLanda-Castro, Midori
dc.contributor.authorSebastián, Paula
dc.contributor.authorGiannotti, Marina Inés
dc.contributor.authorSerrà i Ramos, Albert
dc.contributor.authorGómez, Elvira
dc.date.accessioned2020-09-08T11:16:22Z
dc.date.available2022-08-14T05:10:21Z
dc.date.issued2020-08-14
dc.date.updated2020-09-08T11:16:22Z
dc.description.abstractThe purpose of this systematic study was to investigate the effects of specific substrates and potential conditions applied while tailoring the morphology and chemical composition of nanostructured Co films. In particular, Co electrodeposition in sustainable choline chloride-urea deep eutectic solvent was assessed, using glassy carbon and two metals widely employed in electrocatalysis and biocompatible purposes, Pt and Au, as substrates for modification with Co. Various in situ electrochemical techniques were com- bined with a broad range of ex-situ characterization and chemical-composition techniques for a detailed analysis of the prepared Co films. Among the results, nanostructured Co films with high extended active surface areas and variable composition of oxo and hydroxyl species could be tuned by simply modulating the applied potential limits, and without using additives or surfactant agents. The study highlights the effectiveness of using deep eutectic solvent as suitable electrolyte for surface modification by controlled deposition of nanostructured Co films with further application in electrocatalysis.
dc.format.extent35 p.
dc.format.mimetypeapplication/pdf
dc.identifier.idgrec703037
dc.identifier.issn0013-4686
dc.identifier.urihttps://hdl.handle.net/2445/170320
dc.language.isoeng
dc.publisherElsevier Ltd
dc.relation.isformatofVersió postprint del document publicat a: https://doi.org/10.1016/j.electacta.2020.136928
dc.relation.ispartofElectrochimica Acta, 2020, vol. 359, num. 1, p. 136928-1-136928-12
dc.relation.urihttps://doi.org/10.1016/j.electacta.2020.136928
dc.rightscc-by-nc-nd (c) Elsevier Ltd, 2020
dc.rights.accessRightsinfo:eu-repo/semantics/openAccess
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/3.0/es
dc.sourceArticles publicats en revistes (Ciència dels Materials i Química Física)
dc.subject.classificationGalvanoplàstia
dc.subject.classificationCobalt
dc.subject.classificationNanoestructures
dc.subject.otherElectroplating
dc.subject.otherCobalt
dc.subject.otherNanostructures
dc.titleElectrodeposition of nanostructured cobalt films from a deep eutectic solvent: Influence of the substrate and deposition potential range
dc.typeinfo:eu-repo/semantics/article
dc.typeinfo:eu-repo/semantics/acceptedVersion

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