Light-activated electroforming in ITO/ZnO/p-Si resistive switching devices

dc.contributor.authorBlázquez Gómez, Josep Oriol
dc.contributor.authorFrieiro Castro, Juan Luis
dc.contributor.authorLópez Vidrier, Julià
dc.contributor.authorGuillaume, Clément
dc.contributor.authorPortier, X.
dc.contributor.authorLabbé, Christophe
dc.contributor.authorHernández Márquez, Sergi
dc.contributor.authorGarrido Fernández, Blas
dc.date.accessioned2022-08-26T10:22:12Z
dc.date.available2022-08-26T10:22:12Z
dc.date.issued2019-12-14
dc.date.updated2022-08-26T10:22:12Z
dc.description.abstractWe report on light-activated electroforming of ZnO/p-Si heterojunction memristors with transparent indium tin oxide as the top electrode. Light-generated electron-hole pairs in the p-type substrate are separated by the external electric field and electrons are injected into the active ZnO layer. The additional application of voltage pulses allows achieving different resistance states that end up in the realization of the low resistance state (LRS). This process requires much less voltage compared to dark conditions, thus avoiding undesired current overshoots and achieving a self-compliant device. The transport mechanisms governing each resistance state are studied and discussed. An evolution from an electrode-limited to a space charge-limited transport is observed along the electroforming process before reaching the LRS, which is ascribed to the progressive formation of conductive paths that consequently induce the growth of conductive nanofilaments through the ZnO layer. This work was financially supported by the Spanish Ministry of Economy and Competitiveness (Project Nos. TEC2012-38540-C02-01 and TEC2016-76849-C2-1-R). O.B. also acknowledges the subprogram "Ayudas para Contratos Predoctorales para la Formación de-Doctores" from the Spanish Ministry of Economy and Competitiveness for economical support. J.L.F. acknowledges the subprogram "Ayudas para la Formación de Profesorado Universitario" (No. FPU16/06257) from the Spanish Ministry of Education, Culture and Sports for economical support. X.P., C.L., and C.G. are grateful to C. Frilay for his expertise in the maintenance of the sputtering setup used for the growth of the ZnO films.
dc.format.mimetypeapplication/pdf
dc.identifier.idgrec694415
dc.identifier.issn0003-6951
dc.identifier.urihttps://hdl.handle.net/2445/188441
dc.language.isoeng
dc.publisherAmerican Institute of Physics (AIP)
dc.relation.isformatofReproducció del document publicat a: https://doi.org/10.1063/1.5125844
dc.relation.ispartofApplied Physics Letters, 2019, vol. 115, num. 26, p. 261104
dc.relation.urihttps://doi.org/10.1063/1.5125844
dc.rights(c) American Institute of Physics (AIP), 2019
dc.rights.accessRightsinfo:eu-repo/semantics/openAccess
dc.sourceArticles publicats en revistes (Física Aplicada)
dc.subject.classificationFotolitografia
dc.subject.classificationFotoelectricitat
dc.subject.classificationSemiconductors
dc.subject.otherPhotolithography
dc.subject.otherPhotoelectricity
dc.subject.otherSemiconductors
dc.titleLight-activated electroforming in ITO/ZnO/p-Si resistive switching devices
dc.typeinfo:eu-repo/semantics/article
dc.typeinfo:eu-repo/semantics/publishedVersion

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