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2000

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Please use this identifier to cite or link to this item: https://hdl.handle.net/2445/98754

The role of hydrogen in the formation of microcrystalline silicon

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http://dx.doi.org/10.1016/S0921-5107(99)00324-4

Abstract

The growth mechanisms of microcrystalline silicon thin films at low temperatures (100-250°C) by plasma CVD are still a matter of debate. We have shown that ue-Si:H formation proceeds through four phases (incubation, nucleation, growth and steady state) and that hydrogen plays a key role in this process, particularly during the incubation phase in which hydrogen modifies the amorphous silicon network and forms a highly porous phase where nucleation takes place. In this study we combine in-situ ellipsometry and dark conductivity measurements with ex-situ high resolution transmission electron microscopy to improve our understanding of microcrystalline silicon formation.

Subject

Silici, Hidrogen, Temperatures baixes, Pel·lícules fines

Subject (English)

Silicon, Hydrogen, Low temperatures, Thin films

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Articles publicats en revistes (Física Aplicada)

Citation

FONTCUBERTA I MORRAL, A., BERTOMEU I BALAGUERÓ, Joan and ROCA I CABARROCAS, P. (Pere). The role of hydrogen in the formation of microcrystalline silicon. Materials Science and Engineering B-Solid State Materials for Advanced Technology. 2000. Vol. 69-70, num. 559-563. ISSN 0921-5107. [consulted: 8 of August of 2026]. Available at: https://hdl.handle.net/2445/98754

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