Amb motiu del tancament d'estiu, la validació de documents es reprendrà a partir del 28 d'agost de 2026. Disculpeu les molèsties.
Con motivo del cierre de verano, la validación de documentos se reanudará a partir del 28 de agosto de 2026. Disculpad las molestias
Due to the summer closure, document validation will resume starting August 28, 2026. We apologize for any inconvenience.

Files

561140.pdf (506.72 KB)

Document type

Article

Version

Accepted version

Publication date

2009-01-22

All rights reserved

Please use this identifier to cite or link to this item: https://hdl.handle.net/2445/98047

Hot wire chemical vapor deposition: limits and opportunities of protecting the tungsten catalyzer from silicide with a cavity

Journal Title

Authors

Director/Tutor

Journal ISSN

Volume Title

Related resource

http://dx.doi.org/10.1016/j.tsf.2009.01.023

Abstract

Hot Wire Chemical Vapor Deposition (HW-CVD) is one of the most promising techniques for depositing the intrinsic microcrystalline silicon layer for the production of micro-morph solar cells. However, the silicide formation at the colder ends of the tungsten wire drastically reduces the lifetime of the catalyzer, thus limiting its industrial exploitation. A simple but interesting strategy to decrease the silicide formation is to hide the electrical contacts of the catalyzer in a long narrow cavity which reduces the probability of the silane molecules to reach the colder ends of the wire. In this paper, the working mechanism of the cavity is elucidated. Measurements of the thickness profile of the silicon deposited in the internal walls of the cavity have been compared with those predicted using a simple diffusion model based on the assumption of Knudsen flow. A lifetime study of the protected and unprotected wires has been carried out. The different mechanisms which determine the deterioration of the catalyzer have been identified and discussed.

Subject

Tungstè, Cèl·lules solars, Deposició en fase de vapor, Silici

Subject (English)

Tungsten, Solar cells, Vapor-plating, Silicon

Citation

Collections

Articles publicats en revistes (Física Aplicada)

Citation

FRIGERI, Paolo Antonio, et al. Hot wire chemical vapor deposition: limits and opportunities of protecting the tungsten catalyzer from silicide with a cavity. Thin Solid Films. 2009. Vol. 517, num. 12, pags. 3427-3430. ISSN 0040-6090. [consulted: 11 of August of 2026]. Available at: https://hdl.handle.net/2445/98047

Export metadata

JSON - METS

Share record