Characterization of crystallographic defects in LaNiO3 through TEM image simulations

Abstract

Lanthanum nickel oxide, LaNiO3, is often used as an electrode in many electronic devices due to its low resistivity. The study of its properties requires understanding them in the nanoscale and, for this purpose, the electron transmission microscope is an indispensable tool. In the present work, we aim to examine the defects observed in High Angular Annular Dark Field (HAADF) images of a lanthanum nickel oxide thin film grown epitaxially on a lanthanum aluminate substrate. For this end, High Resolution Transmission Electron Microscopy (HRTEM) and HAADF images are simulated following the multislice method, implemented by Temsim, a software provided freely by E.J. Kirkland. Results show that the multislice method is a powerful tool so as to interpret the defects in the structure