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| Issue Date | Title | Author(s) |
|---|---|---|
| 2015 | Degradation of thin tungsten filaments at high temperature in HWCVD | Frigeri, Paolo Antonio; Nos Aguilà, Oriol; Bertomeu i Balagueró, Joan |
| 30-Jan-2015 | Technological solution for the automatic replacement of the catalytic filaments in HWCVD | Nos Aguilà, Oriol; Frigeri, Paolo Antonio; Bertomeu i Balagueró, Joan |
| 2006 | Low temperature amorphous and nanocrystalline silicon thin film transistors deposited by Hot-Wire CVD on glass substrate | Fonrodona Turon, Marta; Soler Vilamitjana, David; Escarré i Palou, Jordi; Villar, Fernando; Bertomeu i Balagueró, Joan; Andreu i Batallé, Jordi; Saboundji, A.; Coulon, N.; Mohammed-Brahim, T. |
| 2003 | Shutterless deposition of phosphorous doped microcrystalline silicon by Cat-CVD | Fonrodona Turon, Marta; Gordijn, A.; Van Veen, M. K.; Van der Werf, C. H. M.; Bertomeu i Balagueró, Joan; Andreu i Batallé, Jordi; Schropp, Ruud E. I., 1959- |
| 2000 | Optimisation of doped microcrystalline silicon films deposited at very low temperatures by Hot-Wire CVD | Voz Sánchez, Cristóbal; Peiró, D.; Bertomeu i Balagueró, Joan; Soler Vilamitjana, David; Fonrodona Turon, Marta; Andreu i Batallé, Jordi |
| 2001 | Stability of hydrogenated nanocrystalline silicon thin-film transistors | Orpella, Albert; Voz Sánchez, Cristóbal; Puigdollers i González, Joaquim; Dosev, D.; Fonrodona Turon, Marta; Soler Vilamitjana, David; Bertomeu i Balagueró, Joan; Asensi López, José Miguel; Andreu i Batallé, Jordi; Alcubilla González, Ramón |
| 2009 | Amorphous silicon thin film solar cells deposited entirely by Hot-Wire Chemical Vapour Deposition at low temperature (<150 ºC) | Villar, Fernando; Antony, Aldrin; Escarré i Palou, Jordi; Ibarz, D.; Roldán Molinero, Rubén; Stella, Marco; Muñoz Ramos, David; Asensi López, José Miguel; Bertomeu i Balagueró, Joan |
| 1995 | Crystal growth characterization of polycrystalline silicon films obtained by hot-wire chemical vapour deposition | Polo Trasancos, Ma. del Carmen; Peiró Martínez, Francisca; Cifre, J.; Bertomeu i Balagueró, Joan; Puigdollers i González, Joaquim; Andreu i Batallé, Jordi |
| 1995 | P-doped polycrystalline silicon films obtained at low temperature by hot-wire chemical vapor deposition | Puigdollers i González, Joaquim; Cifre, J.; Polo Trasancos, Ma. del Carmen; Bertomeu i Balagueró, Joan; Andreu i Batallé, Jordi; Lloret, A. |
| 1997 | Stress measurements in polycrystalline silicon films grown by hot-wire chemical vapor deposition | Peiró, D.; Bertomeu i Balagueró, Joan; Arrando Comas, Francesc; Andreu i Batallé, Jordi |
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