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Issue Date	Title	Author(s)
2000	The role of hydrogen in the formation of microcrystalline silicon	Fontcuberta i Morral, A.; Bertomeu i Balagueró, Joan; Roca i Cabarrocas, P. (Pere)
11-Jun-2007	Nanocrystalline silicon thin films on PEN substrates	Villar, Fernando; Escarré i Palou, Jordi; Antony, Aldrin; Stella, Marco; Rojas Tarazona, Fredy E.; Asensi López, José Miguel; Bertomeu i Balagueró, Joan; Andreu i Batallé, Jordi
1991	Hydrogen related effects in a-Si:H studied by photothermal deflection spectroscopy	Serra-Miralles, J.; Andreu i Batallé, Jordi; Sardin, Georges; Roch i Cunill, Carles; Asensi López, José Miguel; Bertomeu i Balagueró, Joan; Esteve Pujol, Joan
1994	Polycrystalline silicon films obtained by hot-wire chemical vapour deposition	Cifre, J.; Bertomeu i Balagueró, Joan; Puigdollers i González, Joaquim; Polo Trasancos, Ma. del Carmen; Andreu i Batallé, Jordi; Lloret, A.
1995	P-doped polycrystalline silicon films obtained at low temperature by hot-wire chemical vapor deposition	Puigdollers i González, Joaquim; Cifre, J.; Polo Trasancos, Ma. del Carmen; Bertomeu i Balagueró, Joan; Andreu i Batallé, Jordi; Lloret, A.
1997	Stress measurements in polycrystalline silicon films grown by hot-wire chemical vapor deposition	Peiró, D.; Bertomeu i Balagueró, Joan; Arrando Comas, Francesc; Andreu i Batallé, Jordi
2001	Kelvin probe measurements of microcrystalline silicon on a nanometer scale using SFM	Breymesser, A.; Schlosser, V.; Peiró, D.; Voz Sánchez, Cristóbal; Bertomeu i Balagueró, Joan; Andreu i Batallé, Jordi; Summhammer, J.
30-Nov-2016	Main properties of Al2O3 thin films deposited by magnetron sputtering of an Al2O3 ceramic target at different radio-frequency power and argon pressure and their passivation effect on p-type c-Si wafers	García-Valenzuela, Jorge A.; Rivera, R.; Morales-Vilches, A. B.; Gerling-Sarabia, L. G.; Caballero, A.; Asensi López, José Miguel; Voz Sánchez, Cristóbal; Bertomeu i Balagueró, Joan; Andreu i Batallé, Jordi
1999	Ultrafine particles produced by plasma enhanced chemical vapor deposition -from SiH4, CH4, NH3 and B2H6 gas mixtures- for nanostructured ceramics applications	Bertrán Serra, Enric; Costa i Balanzat, Josep; Viera Mármol, Gregorio; Andújar Bella, José Luis; Canillas i Biosca, Adolf; Pascual Miralles, Esther
2000	Microcrystalline silicon thin film transistors obtained by Hot-Wire CVD	Puigdollers i González, Joaquim; Orpella, Albert; Alcubilla González, Ramón; Dosev, D.; Pallarés Curto, Jordi; Peiró, D.; Voz Sánchez, Cristóbal; Bertomeu i Balagueró, Joan; Andreu i Batallé, Jordi; Marsal Garví, Lluís F. (Lluís Francesc)