Mueller matrix spectroscopic ellipsometry of a thin ZnO anisotropic crystal layer and its optical properties

Abstract

We have determined the optical properties (ordinary and extraordinary index of refraction) of a thin anisotropic uniaxial sample of ZnO on a glass substrate, using a 4-photoelastic modulator polarimeter (4PEM). The analysis was done by shining a light beam on two points of the sample, to analyse its inhomogeneity, and by 3 different incidence angles for each point. Using a preesxisting Matlab code to fit the 4PEM results, the coefficients of the Mueller Matrix (MM) were simulated for each wavelength, from 400 nm to 800 nm, and then the indices of refraction were calculated using a Sellmeier expression and compared with the values of ZnO bulk monocrystal from the bibliography