Amb motiu del tancament d'estiu, la validació de documents es reprendrà a partir del 28 d'agost de 2026. Disculpeu les molèsties.
Con motivo del cierre de verano, la validación de documentos se reanudará a partir del 28 de agosto de 2026. Disculpad las molestias
Due to the summer closure, document validation will resume starting August 28, 2026. We apologize for any inconvenience.

Fitxers

574678.pdf (377.55 KB)

Tipus de document

Article

Versió

Versió publicada

Data de publicació

2009-08-05

Tots els drets reservats

Si us plau utilitzeu sempre aquest identificador per citar o enllaçar aquest document: https://hdl.handle.net/2445/24963

Plasma parameters of pulsed-dc discharges in methane used to deposit diamondlike carbon films

Títol de la revista

Autors

Director/Tutor

ISSN de la revista

Títol del volum

Recurs relacionat

http://dx.doi.org/10.1063/1.3183945

Resum

Here we approximate the plasma kinetics responsible for diamondlike carbon (DLC) depositions that result from pulsed-dc discharges. The DLC films were deposited at room temperature by plasma-enhanced chemical vapor deposition (PECVD) in a methane (CH4) atmosphere at 10 Pa. We compared the plasma characteristics of asymmetric bipolar pulsed-dc discharges at 100 kHz to those produced by a radio frequency (rf) source. The electrical discharges were monitored by a computer-controlled Langmuir probe operating in time-resolved mode. The acquisition system provided the intensity-voltage (I-V) characteristics with a time resolution of 1 μs. This facilitated the discussion of the variation in plasma parameters within a pulse cycle as a function of the pulse waveform and the peak voltage. The electron distribution was clearly divided into high- and low-energy Maxwellian populations of electrons (a bi-Maxwellian population) at the beginning of the negative voltage region of the pulse. We ascribe this to intense stoc...

Matèries

Metà, Electrons, Pel·lícules fines, Revestiments protectors, Aplicacions industrials, Plasma (Gasos ionitzats)

Matèries (anglès)

Methane, Electrons, Thin films, Protective coatings, Industrial applications, Plasma (Ionized gases)

Citació

Col·leccions

Articles publicats en revistes (Física Aplicada)

Citació

CORBELLA ROCA, Carles, et al. Plasma parameters of pulsed-dc discharges in methane used to deposit diamondlike carbon films. Journal of Applied Physics. 2009. Vol. 106, num. 3, pags. 033302. ISSN 0021-8979. [consulted: 10 of August of 2026]. Available at: https://hdl.handle.net/2445/24963

Exportar metadades

JSON - METS

Compartir registre