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Plasma parameters of pulsed-dc discharges in methane used to deposit diamondlike carbon films
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Here we approximate the plasma kinetics responsible for diamondlike carbon (DLC) depositions that result from pulsed-dc discharges. The DLC films were deposited at room temperature by plasma-enhanced chemical vapor deposition (PECVD) in a methane (CH4) atmosphere at 10 Pa. We compared the plasma characteristics of asymmetric bipolar pulsed-dc discharges at 100 kHz to those produced by a radio frequency (rf) source. The electrical discharges were monitored by a computer-controlled Langmuir probe operating in time-resolved mode. The acquisition system provided the intensity-voltage (I-V) characteristics with a time resolution of 1 μs. This facilitated the discussion of the variation in plasma parameters within a pulse cycle as a function of the pulse waveform and the peak voltage. The electron distribution was clearly divided into high- and low-energy Maxwellian populations of electrons (a bi-Maxwellian population) at the beginning of the negative voltage region of the pulse. We ascribe this to intense stoc...
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CORBELLA ROCA, Carles, et al. Plasma parameters of pulsed-dc discharges in methane used to deposit diamondlike carbon films. Journal of Applied Physics. 2009. Vol. 106, num. 3, pags. 033302. ISSN 0021-8979. [consulted: 13 of October of 2026]. Available at: https://hdl.handle.net/2445/24963