Plasma parameters of pulsed-dc discharges in methane used to deposit diamondlike carbon films

dc.contributor.authorCorbella Roca, Carlescat
dc.contributor.authorRubio Roy, Miguelcat
dc.contributor.authorBertrán Serra, Enriccat
dc.contributor.authorAndújar Bella, José Luiscat
dc.date.accessioned2012-05-07T06:44:53Z
dc.date.available2012-05-07T06:44:53Z
dc.date.issued2009-08-05
dc.description.abstractHere we approximate the plasma kinetics responsible for diamondlike carbon (DLC) depositions that result from pulsed-dc discharges. The DLC films were deposited at room temperature by plasma-enhanced chemical vapor deposition (PECVD) in a methane (CH4) atmosphere at 10 Pa. We compared the plasma characteristics of asymmetric bipolar pulsed-dc discharges at 100 kHz to those produced by a radio frequency (rf) source. The electrical discharges were monitored by a computer-controlled Langmuir probe operating in time-resolved mode. The acquisition system provided the intensity-voltage (I-V) characteristics with a time resolution of 1 μs. This facilitated the discussion of the variation in plasma parameters within a pulse cycle as a function of the pulse waveform and the peak voltage. The electron distribution was clearly divided into high- and low-energy Maxwellian populations of electrons (a bi-Maxwellian population) at the beginning of the negative voltage region of the pulse. We ascribe this to intense stoc...
dc.format.extent11 p.
dc.format.mimetypeapplication/pdf
dc.identifier.idgrec574678
dc.identifier.issn0021-8979
dc.identifier.urihttps://hdl.handle.net/2445/24963
dc.language.isoeng
dc.publisherAmerican Institute of Physics
dc.relation.isformatofReproducció del document publicat a: http://dx.doi.org/10.1063/1.3183945
dc.relation.ispartofJournal of Applied Physics, 2009, vol. 106, núm. 3, p. 033302
dc.relation.urihttp://dx.doi.org/10.1063/1.3183945
dc.rights(c) American Institute of Physics, 2009
dc.rights.accessRightsinfo:eu-repo/semantics/openAccess
dc.sourceArticles publicats en revistes (Física Aplicada)
dc.subject.classificationMetàcat
dc.subject.classificationElectronscat
dc.subject.classificationPel·lícules finescat
dc.subject.classificationRevestiments protectorscat
dc.subject.classificationAplicacions industrialscat
dc.subject.classificationPlasma (Gasos ionitzats)cat
dc.subject.otherMethaneeng
dc.subject.otherElectronseng
dc.subject.otherThin filmseng
dc.subject.otherProtective coatingseng
dc.subject.otherIndustrial applicationseng
dc.subject.otherPlasma (Ionized gases)eng
dc.titlePlasma parameters of pulsed-dc discharges in methane used to deposit diamondlike carbon filmseng
dc.typeinfo:eu-repo/semantics/article
dc.typeinfo:eu-repo/semantics/publishedVersion

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