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Article

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2000

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Please use this identifier to cite or link to this item: https://hdl.handle.net/2445/24307

Roughness and light scattering of ion-beam-sputtered fluoride coatings for 193 nm

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http://dx.doi.org/10.1364/AO.39.005854

Abstract

Scattering characteristics of multilayer fluoride coatings for 193 nm deposited by ion beam sputtering and the related interfacial roughnesses are investigated. Quarter- and half-wave stacks of MgF2 and LaF3 with increasing thickness are deposited onto CaF2 and fused silica and are systematically characterized. Roughness measurements carried out by atomic force microscopy reveal the evolution of the power spectral densities of the interfaces with coating thickness. Backward-scattering measurements are presented, and the results are compared with theoretical predictions that use different models for the statistical correlation of interfacial roughnesses.

Subject

Dispersió de la llum, Òptica electrònica

Subject (English)

Light scattering, Electron optics

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Articles publicats en revistes (Física Aplicada)

Citation

FERRÉ BORRULL, Josep, DUPARRÉ, Angela and QUESNEL, Etienne. Roughness and light scattering of ion-beam-sputtered fluoride coatings for 193 nm. Applied Optics. 2000. Vol. 39, num. Issue 31, pags. 5854-5864. ISSN 0003-6935. [consulted: 13 of August of 2026]. Available at: https://hdl.handle.net/2445/24307

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