Roughness and light scattering of ion-beam-sputtered fluoride coatings for 193 nm

dc.contributor.authorFerré Borrull, Josepcat
dc.contributor.authorDuparré, Angelacat
dc.contributor.authorQuesnel, Etiennecat
dc.date.accessioned2012-04-23T07:03:47Z
dc.date.available2012-04-23T07:03:47Z
dc.date.issued2000
dc.description.abstractScattering characteristics of multilayer fluoride coatings for 193 nm deposited by ion beam sputtering and the related interfacial roughnesses are investigated. Quarter- and half-wave stacks of MgF2 and LaF3 with increasing thickness are deposited onto CaF2 and fused silica and are systematically characterized. Roughness measurements carried out by atomic force microscopy reveal the evolution of the power spectral densities of the interfaces with coating thickness. Backward-scattering measurements are presented, and the results are compared with theoretical predictions that use different models for the statistical correlation of interfacial roughnesses.eng
dc.format.extent11 p.
dc.format.mimetypeapplication/pdf
dc.identifier.idgrec194020
dc.identifier.issn0003-6935
dc.identifier.urihttps://hdl.handle.net/2445/24307
dc.language.isoengeng
dc.publisherOptical Society of America
dc.relation.isformatofReproducció del document publicat a: http://dx.doi.org/10.1364/AO.39.005854
dc.relation.ispartofApplied Optics, 2000, Vol. 39, Issue 31, pp. 5854-5864
dc.relation.urihttp://dx.doi.org/10.1364/AO.39.005854
dc.rights(c) Optical Society of America, 2000
dc.rights.accessRightsinfo:eu-repo/semantics/openAccess
dc.sourceArticles publicats en revistes (Física Aplicada)
dc.subject.classificationDispersió de la llumcat
dc.subject.classificationÒptica electrònicacat
dc.subject.otherLight scatteringeng
dc.subject.otherElectron opticseng
dc.titleRoughness and light scattering of ion-beam-sputtered fluoride coatings for 193 nm
dc.typeinfo:eu-repo/semantics/article
dc.typeinfo:eu-repo/semantics/publishedVersion

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