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Please use this identifier to cite or link to this item: https://hdl.handle.net/2445/125195
Electroresistance in non-tunnelling ferroelectric junctions
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Ferroelectric materials are of potential interest for their integration in memristive devices. Polarization switching in ferroelectric thin film junctions might lead to a change of the electronic band diagram of the device, which can result in important changes of resistance. This effect is known as electroresistance. Electroresistance in 12.2, 24.3 and 36.5 nm BTO thin films junctions is investigated. It is observed that electroresistance decreases with thickness. In addition, ferroelectric characterization allows to conclude that switchable ferroelectric polarization also decreases with thickness. Thus, we conclude that electroresistance is intimately linked to the ferroelectric switching process.
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Treballs Finals de Grau de Física, Facultat de Física, Universitat de Barcelona, Curs: 2018, Tutor: Ignasi Fina
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PRIETO VIERTEL, Guillermo. Electroresistance in non-tunnelling ferroelectric junctions. [consulted: 6 of June of 2026]. Available at: https://hdl.handle.net/2445/125195