Search


Current filters:


Start a new search
Add filters:

Use filters to refine the search results.


Results 1-6 of 6 (Search time: 0.006 seconds).
  • previous
  • 1
  • next
Item hits:
Issue DateTitleAuthor(s)
1997Infrared characterization of a-Si:H/a-Si1-xCx:H interfacesBertomeu i Balagueró, Joan; Puigdollers i González, Joaquim; Asensi López, José Miguel; Andreu i Batallé, Jordi
Jul-1997A fully automated hot-wall multiplasma-monochamber reactor for thin film depositionRoca i Cabarrocas, P. (Pere); Chevrier, J. B.; Huc, J.; Lloret, A.; Parey, J. Y.; Schmitt, J. P. M.
1991Ellipsometric study of a-Si:H thin films deposited by square wave modulated rf glow dischargeLloret, A.; Bertrán Serra, Enric; Andújar Bella, José Luis; Canillas i Biosca, Adolf; Morenza Gil, José Luis
1992Properties of amorphous silicon thin films grown in square wave modulated silane rf discharges.Andújar Bella, José Luis; Bertrán Serra, Enric; Canillas i Biosca, Adolf; Campmany i Guillot, Josep, 1966-; Serra-Miralles, J.; Roch i Cunill, Carles; Lloret, A.
1991Effect of substrate temperature on deposition rate of rf plasma-deposited hydrogenated amorphous silicon thin filmsAndújar Bella, José Luis; Bertrán Serra, Enric; Canillas i Biosca, Adolf; Campmany i Guillot, Josep, 1966-; Morenza Gil, José Luis
1993Structure of a-Si:H/a-Si1-xCx:H multilayers deposited in a reactor with automated substrate holderBertomeu i Balagueró, Joan; Asensi López, José Miguel; Puigdollers i González, Joaquim; Andreu i Batallé, Jordi; Morenza Gil, José Luis