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| Issue Date | Title | Author(s) |
|---|---|---|
| 2009 | Amorphous silicon thin film solar cells deposited entirely by Hot-Wire Chemical Vapour Deposition at low temperature (<150 ºC) | Villar, Fernando; Antony, Aldrin; Escarré i Palou, Jordi; Ibarz, D.; Roldán Molinero, Rubén; Stella, Marco; Muñoz Ramos, David; Asensi López, José Miguel; Bertomeu i Balagueró, Joan |
| 2000 | Optimisation of doped microcrystalline silicon films deposited at very low temperatures by Hot-Wire CVD | Voz Sánchez, Cristóbal; Peiró, D.; Bertomeu i Balagueró, Joan; Soler Vilamitjana, David; Fonrodona Turon, Marta; Andreu i Batallé, Jordi |
| 2005 | Top-gate microcrystalline silicon TFTs processed at low temperature (<200ºC) | Saboundji, A.; Coulon, N.; Gorin, A.; Lhermite, H.; Mohammed-Brahim, T.; Fonrodona Turon, Marta; Bertomeu i Balagueró, Joan; Andreu i Batallé, Jordi |
| 2000 | Thin Film Transistors obtained by Hot-Wire CVD | Puigdollers i González, Joaquim; Orpella, Albert; Dosev, D.; Voz Sánchez, Cristóbal; Pallarés Curto, Jordi; Marsal Garví, Lluís F. (Lluís Francesc); Bertomeu i Balagueró, Joan; Andreu i Batallé, Jordi; Alcubilla González, Ramón; Peiró, D. |
| 2000 | The role of hydrogen in the formation of microcrystalline silicon | Fontcuberta i Morral, A.; Bertomeu i Balagueró, Joan; Roca i Cabarrocas, P. (Pere) |
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