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| Issue Date | Title | Author(s) |
|---|---|---|
| 31-Mar-2014 | Compositional influence on the electrical performance of zinc indium tin oxide transparent thin-film transistors | Marsal, A.; Carreras Seguí, Paz; Puigdollers i González, Joaquim; Voz Sánchez, Cristóbal; Galindo, S.; Alcubilla González, Ramón; Bertomeu i Balagueró, Joan; Antony, Aldrin |
| 2000 | Microcrystalline silicon thin film transistors obtained by Hot-Wire CVD | Puigdollers i González, Joaquim; Orpella, Albert; Alcubilla González, Ramón; Dosev, D.; Pallarés Curto, Jordi; Peiró, D.; Voz Sánchez, Cristóbal; Bertomeu i Balagueró, Joan; Andreu i Batallé, Jordi; Marsal Garví, Lluís F. (Lluís Francesc) |
| 2000 | Optimisation of doped microcrystalline silicon films deposited at very low temperatures by Hot-Wire CVD | Voz Sánchez, Cristóbal; Peiró, D.; Bertomeu i Balagueró, Joan; Soler Vilamitjana, David; Fonrodona Turon, Marta; Andreu i Batallé, Jordi |
| 2001 | Stability of hydrogenated nanocrystalline silicon thin-film transistors | Orpella, Albert; Voz Sánchez, Cristóbal; Puigdollers i González, Joaquim; Dosev, D.; Fonrodona Turon, Marta; Soler Vilamitjana, David; Bertomeu i Balagueró, Joan; Asensi López, José Miguel; Andreu i Batallé, Jordi; Alcubilla González, Ramón |
| 2001 | Thin silicon films ranging from amorphous to nanocrystalline obtained by Hot-Wire CVD | Soler Vilamitjana, David; Fonrodona Turon, Marta; Voz Sánchez, Cristóbal; Bertomeu i Balagueró, Joan; Andreu i Batallé, Jordi |
| 2003 | Surface passivation of crystalline silicon by Cat-CVD amorphous and nanocrystalline thin silicon films | Voz Sánchez, Cristóbal; Martin Garcia, Isidro; Orpella, Albert; Puigdollers i González, Joaquim; Vetter, M.; Alcubilla González, Ramón; Soler Vilamitjana, David; Fonrodona Turon, Marta; Bertomeu i Balagueró, Joan; Andreu i Batallé, Jordi |
| 2003 | Substrate influence on the properties of doped thin silicon layers grown by Cat-CVD | Soler Vilamitjana, David; Fonrodona Turon, Marta; Voz Sánchez, Cristóbal; Asensi López, José Miguel; Bertomeu i Balagueró, Joan; Andreu i Batallé, Jordi |
| 2000 | Thin Film Transistors obtained by Hot-Wire CVD | Puigdollers i González, Joaquim; Orpella, Albert; Dosev, D.; Voz Sánchez, Cristóbal; Pallarés Curto, Jordi; Marsal Garví, Lluís F. (Lluís Francesc); Bertomeu i Balagueró, Joan; Andreu i Batallé, Jordi; Alcubilla González, Ramón; Peiró, D. |
| 2001 | Analysis of bias stress on thin-film transistors obtained by Hot-Wire Chemical Vapour Deposition | Dosev, D.; Puigdollers i González, Joaquim; Orpella, Albert; Voz Sánchez, Cristóbal; Fonrodona Turon, Marta; Soler Vilamitjana, David; Marsal Garví, Lluís F. (Lluís Francesc); Pallarés Curto, Jordi; Bertomeu i Balagueró, Joan; Andreu i Batallé, Jordi; Alcubilla González, Ramón |
| 30-Nov-2016 | Main properties of Al2O3 thin films deposited by magnetron sputtering of an Al2O3 ceramic target at different radio-frequency power and argon pressure and their passivation effect on p-type c-Si wafers | García-Valenzuela, Jorge A.; Rivera, R.; Morales-Vilches, A. B.; Gerling-Sarabia, L. G.; Caballero, A.; Asensi López, José Miguel; Voz Sánchez, Cristóbal; Bertomeu i Balagueró, Joan; Andreu i Batallé, Jordi |
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