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| Issue Date | Title | Author(s) |
|---|---|---|
| 2000 | Thin Film Transistors obtained by Hot-Wire CVD | Puigdollers i González, Joaquim; Orpella, Albert; Dosev, D.; Voz Sánchez, Cristóbal; Pallarés Curto, Jordi; Marsal Garví, Lluís F. (Lluís Francesc); Bertomeu i Balagueró, Joan; Andreu i Batallé, Jordi; Alcubilla González, Ramón; Peiró, D. |
| 2006 | Low temperature amorphous and nanocrystalline silicon thin film transistors deposited by Hot-Wire CVD on glass substrate | Fonrodona Turon, Marta; Soler Vilamitjana, David; Escarré i Palou, Jordi; Villar, Fernando; Bertomeu i Balagueró, Joan; Andreu i Batallé, Jordi; Saboundji, A.; Coulon, N.; Mohammed-Brahim, T. |
| Apr-2016 | Aluminium induced texturing of glass substrates with improved light management for thin film solar cells | Lluscà Jané, Marta; Urbain, Félix; Smirnov, Vladimir; Antony, Aldrin; Andreu i Batallé, Jordi; Bertomeu i Balagueró, Joan |
| 1995 | Crystal growth characterization of polycrystalline silicon films obtained by hot-wire chemical vapour deposition | Polo Trasancos, Ma. del Carmen; Peiró Martínez, Francisca; Cifre, J.; Bertomeu i Balagueró, Joan; Puigdollers i González, Joaquim; Andreu i Batallé, Jordi |
| 2000 | The role of hydrogen in the formation of microcrystalline silicon | Fontcuberta i Morral, A.; Bertomeu i Balagueró, Joan; Roca i Cabarrocas, P. (Pere) |
| 2001 | Analysis of bias stress on thin-film transistors obtained by Hot-Wire Chemical Vapour Deposition | Dosev, D.; Puigdollers i González, Joaquim; Orpella, Albert; Voz Sánchez, Cristóbal; Fonrodona Turon, Marta; Soler Vilamitjana, David; Marsal Garví, Lluís F. (Lluís Francesc); Pallarés Curto, Jordi; Bertomeu i Balagueró, Joan; Andreu i Batallé, Jordi; Alcubilla González, Ramón |
| 1994 | Polycrystalline silicon films obtained by hot-wire chemical vapour deposition | Cifre, J.; Bertomeu i Balagueró, Joan; Puigdollers i González, Joaquim; Polo Trasancos, Ma. del Carmen; Andreu i Batallé, Jordi; Lloret, A. |
| 1995 | P-doped polycrystalline silicon films obtained at low temperature by hot-wire chemical vapor deposition | Puigdollers i González, Joaquim; Cifre, J.; Polo Trasancos, Ma. del Carmen; Bertomeu i Balagueró, Joan; Andreu i Batallé, Jordi; Lloret, A. |
| 30-Nov-2016 | Main properties of Al2O3 thin films deposited by magnetron sputtering of an Al2O3 ceramic target at different radio-frequency power and argon pressure and their passivation effect on p-type c-Si wafers | García-Valenzuela, Jorge A.; Rivera, R.; Morales-Vilches, A. B.; Gerling-Sarabia, L. G.; Caballero, A.; Asensi López, José Miguel; Voz Sánchez, Cristóbal; Bertomeu i Balagueró, Joan; Andreu i Batallé, Jordi |
| 2002 | Electronic transport in low temperature nanocrystalline silicon thin-film transistors obtained by Hot-Wire CVD | Puigdollers i González, Joaquim; Voz Sánchez, Cristóbal; Orpella, Albert; Martin Garcia, Isidro; Soler Vilamitjana, David; Fonrodona Turon, Marta; Bertomeu i Balagueró, Joan; Andreu i Batallé, Jordi; Alcubilla González, Ramón |
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