Browsing by Author Nos Aguilà, Oriol

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Showing results 1 to 12 of 12
Issue DateTitleAuthor(s)
2015Degradation of thin tungsten filaments at high temperature in HWCVDFrigeri, Paolo Antonio; Nos Aguilà, Oriol; Bertomeu i Balagueró, Joan
22-Jan-2009Hot wire chemical vapor deposition: limits and opportunities of protecting the tungsten catalyzer from silicide with a cavityFrigeri, Paolo Antonio; Nos Aguilà, Oriol; Bengoechea, S.; Frevert, C.; Asensi López, José Miguel; Bertomeu i Balagueró, Joan
2011Hot wire configuration for depositing device grade nano-crystalline silicon at high deposition rateNos Aguilà, Oriol; Frigeri, Paolo Antonio; Bertomeu i Balagueró, Joan
7-Jan-2013HWCVD Technology Development Addressed to the High Rate Deposition of mi-c-Si:HNos Aguilà, Oriol
2010Influence of RF power on the properties of sputtered ZnO:Al thin filmsAntony, Aldrin; Carreras Seguí, Paz; Keitzl, Thomas; Roldán, Rubén; Nos Aguilà, Oriol; Frigeri, Paolo Antonio; Asensi López, José Miguel; Bertomeu i Balagueró, Joan
2014Real-time monitoring of the silicidation process of tungsten filaments at high temperature used as catalysers for silane decompositionNos Aguilà, Oriol; Frigeri, Paolo Antonio; Bertomeu i Balagueró, Joan
2010Relaxation and derelaxation of pure and hydrogenated amorphous silicon during thermal annealing experimentsKail, F.; Farjas Silva, Jordi; Roura Grabulosa, Pere; Secouard, C.; Nos Aguilà, Oriol; Bertomeu i Balagueró, Joan; Alzina Sureda, Francesc; Roca i Cabarrocas, P. (Pere)
2009Selective ablation of photovoltaic materials with UV laser sources for monolithic interconnection of devices based on a-Si:HMolpeceres, C.; Lauzurica, S.; García-Ballesteros, J. J.; Morales, M.; Guadaño, G.; Ocaña, J. L.; Fernández, S.; Gandía, J. J.; Villar, Fernando; Nos Aguilà, Oriol; Bertomeu i Balagueró, Joan
30-Jan-2015Technological solution for the automatic replacement of the catalytic filaments in HWCVDNos Aguilà, Oriol; Frigeri, Paolo Antonio; Bertomeu i Balagueró, Joan
19-Sep-2011The configurational energy gap between amorphous and crystalline siliconKail, F.; Farjas Silva, Jordi; Roura Grabulosa, Pere; Secouard, C.; Nos Aguilà, Oriol; Bertomeu i Balagueró, Joan; Roca i Cabarrocas, P. (Pere)
2010Transparent conducting thin films by the co-sputtering of ZnO-ITO targetsCarreras Seguí, Paz; Antony, Aldrin; Roldán, Rubén; Nos Aguilà, Oriol; Frigeri, Paolo Antonio; Asensi López, José Miguel; Bertomeu i Balagueró, Joan
2010Uniformity Study of Amorphous and Microcrystalline Silicon Thin Films Deposited on 10cmx10cm Glass Substrate using Hot Wire CVD TechniqueFrigeri, Paolo Antonio; Nos Aguilà, Oriol; Calvo, J. D.; Carreras Seguí, Paz; Roldán, Rubén; Antony, Aldrin; Asensi López, José Miguel; Bertomeu i Balagueró, Joan