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| Issue Date | Title | Author(s) |
|---|---|---|
| 2009 | Amorphous silicon thin film solar cells deposited entirely by Hot-Wire Chemical Vapour Deposition at low temperature (<150 ºC) | Villar, Fernando; Antony, Aldrin; Escarré i Palou, Jordi; Ibarz, D.; Roldán Molinero, Rubén; Stella, Marco; Muñoz Ramos, David; Asensi López, José Miguel; Bertomeu i Balagueró, Joan |
| 2001 | Optoelectronic studies in nanocrystalline silicon Schottky diodes obtained by Hot-Wire Chemical Vapour Deposition | Voz Sánchez, Cristóbal; Soler Vilamitjana, David; Fonrodona Turon, Marta; Bertomeu i Balagueró, Joan; Asensi López, José Miguel; Andreu i Batallé, Jordi |
| 2000 | Microcrystalline silicon thin film transistors obtained by Hot-Wire CVD | Puigdollers i González, Joaquim; Orpella, Albert; Alcubilla González, Ramón; Dosev, D.; Pallarés Curto, Jordi; Peiró, D.; Voz Sánchez, Cristóbal; Bertomeu i Balagueró, Joan; Andreu i Batallé, Jordi; Marsal Garví, Lluís F. (Lluís Francesc) |
| 2006 | Progress in single junction microcrystalline silicon solar cells deposited by Hot-Wire CVD | Fonrodona Turon, Marta; Soler Vilamitjana, David; Villar, Fernando; Escarré i Palou, Jordi; Asensi López, José Miguel; Bertomeu i Balagueró, Joan; Andreu i Batallé, Jordi |
| 2000 | Microdoping compensation of microcrystalline silicon obtained by Hot-Wire Chemical Vapour Deposition | Voz Sánchez, Cristóbal; Peiró, D.; Fonrodona Turon, Marta; Soler Vilamitjana, David; Bertomeu i Balagueró, Joan; Andreu i Batallé, Jordi |
| 2010 | Uniformity Study of Amorphous and Microcrystalline Silicon Thin Films Deposited on 10cmx10cm Glass Substrate using Hot Wire CVD Technique | Frigeri, Paolo Antonio; Nos Aguilà, Oriol; Calvo, J. D.; Carreras Seguí, Paz; Roldán Molinero, Rubén; Antony, Aldrin; Asensi López, José Miguel; Bertomeu i Balagueró, Joan |
| 2004 | Control of doped layers in p-i-n microcrystalline solar cells fully deposited with HWCVD | Fonrodona Turon, Marta; Soler Vilamitjana, David; Escarré i Palou, Jordi; Asensi López, José Miguel; Bertomeu i Balagueró, Joan; Andreu i Batallé, Jordi |
| 1993 | Structure of a-Si:H/a-Si1-xCx:H multilayers deposited in a reactor with automated substrate holder | Bertomeu i Balagueró, Joan; Asensi López, José Miguel; Puigdollers i González, Joaquim; Andreu i Batallé, Jordi; Morenza Gil, José Luis |
| 2002 | Studies on grain boundaries in nanocrystalline silicon grown by Hot-Wire CVD | Fonrodona Turon, Marta; Soler Vilamitjana, David; Asensi López, José Miguel; Bertomeu i Balagueró, Joan; Andreu i Batallé, Jordi |
| 2003 | Shutterless deposition of phosphorous doped microcrystalline silicon by Cat-CVD | Fonrodona Turon, Marta; Gordijn, A.; Van Veen, M. K.; Van der Werf, C. H. M.; Bertomeu i Balagueró, Joan; Andreu i Batallé, Jordi; Schropp, Ruud E. I., 1959- |
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